Development of Fluorine Induced Plasma Activating Room-temperature Bonding Stratage for High-pressure Micro-nano Fluidic Devices
نویسندگان
چکیده
We developed room-temperature bonding of micro-nanofluidic device using fluorine induced plasma activation method. Fluorine was induced by O2 reactive ion etching (RIE) plasma treatment with Teflon Pieces which increased the bonding strength between fused silica glass substrates. The room-temperature bonded fused silica glass micro-nanofluidic device had high bonding strength as well as could work continuously without leakage during liquid introduction driven by air pressure even at 2000 kPa
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